Brief	Ph.D. dissertation research on how halogen gases etch silicon substrate in atomic scale. Experiments were conducted at the National Synchrotron Light Source (NSLS), Brookhaven National Laboratory, Upton, NY (then the #1 brightest x-ray light source in the world).
Technology/ Innovation	Surface physics, ultra high/high vacuum, synchrotron soft x-ray spectroscopy, Auger electron spectroscopy, LEED spectroscopy, photo stimulated desorption spectroscopy. Develop models for explaining the observation of experimental data, that was taken to investigate how temperature, geometric and electronic properties of the silicon substrate could affect etching processes.
System/ Electronics	Served as a team member for upgrading the electronics and control system at the IBM U-8 beamlines, the National Synchrotron Light Source (NSLS), Brookhaven National Laboratory. I was a teach assistance for the 'Micro-processor(Intel 8085)', 'Circuit Analysis' (Laplace and Fourier transform) and 'Electronics' courses.
Software	Programming in Fortran 77 for improving an in-house numerical fitting program for analyzing photoemission spectra. I was a teaching assistance for 'Numerical Analysis'.
Mechanical	I served as one of the key members in the design and construction of ultra-high vacuum (UHV) chambers, sample transfer mechanism and detectors at UCR.
Publications	J. A. Yarmoff, V. Chakarian, T. D. Durbin, C. W. Lo, D. K. Shuh, W. C. Simpson, and P. R. Varekamp, “Photon Stimulated Desorption of Halogens”, Nucl. Instrum. Methods, 101, 60(1995). D.K. Shuh, C.W. Lo, and J.A. Yarmoff, “Chlorine Chemisorption on and the Onset of Etching of GaAs(110) at Room Temperature,” Surf. Sci. 303, 89(1994). T.D. Durbin, W.C. Simpson, V. Chakarian, D.K. Shuh, P.R. Varekamp, C.W. Lo, J.A. Yarmoff, “Stimulated desorption of Cl+ and the chemisorption of Cl2 on Si(111)-7x7 and Si(100)-2x1,” Surf. Sci., 316, 257(1994). C.W. Lo, D.K. Shuh, V. Chakarian, T.D. Durbin, P.R. Varekamp, and J.A. Yarmoff, "XeF2 Etching of Si(111): The Geometric Structure of the Reaction Layer," Phys. Rev. B, 47, 15648(1993). C.W. Lo, D.K. Shuh, and J.A. Yarmoff, "The Influence of Electronic Structure on XeF2 Etching of Si(111)," J. Vac. Sci. Technol., 11, 2054(1993). C.W. Lo, P.R. Varekamp, D.K. Shuh, T.D. Durbin, V. Chakarian, and J. A. Yarmoff, "Substrate Disorder Induced by a Surface Chemical Reaction: The Fluorine Silicon Interaction", Surf. Sci. 292, 171(1993). J.A. Yarmoff, D.K. Shuh, V. Chakarian, P.R. Varekamp, T.D. Durbin, K.A.H. German, and C.W. Lo, "Photon Stimulated Desorption of Fluorine from Semiconductor Surfaces", in Desorption Induced by Electronic Transitions DIET-V, (Springer-Verlag, Berlin, 1993), p. 253-258. J.A. Yarmoff, D.K. Shuh, T.D. Durbin, C.W. Lo, D.A. Lapiano-Smith, F.R. McFeely and F.J. Himpsel, "Atomic Layer Epitaxy of Silicon by Dichlorosilane Studied with Core Level Spectroscopy", J. Vac. Sci. Technol. A 10, 2303(1992). C.W. Lo, D.K. Shuh, V. Chakarian, K.A. German and J.A. Yarmoff, "Synchrotron Radiation Studies of the XeF2 Etching of Silicon," in Proceedings of the Conference on Dry Processing, Tokyo, Japan, November, 1990. J.A. Yarmoff, S.A. Joyce, C.W. Lo and J. Song, "Photon Stimulated Desorption of Fluorine from Silicon Etched with XeF2," in Desorption Induced by Electronic Transitions DIET-IV, edited by G. Betz and P. Varga (Springer-Verlag, Berlin, 1990), p. 65-74.

Brief

Ph.D. dissertation research on how halogen gases etch silicon substrate in atomic scale. Experiments were conducted at the National Synchrotron Light Source (NSLS), Brookhaven National Laboratory, Upton, NY (then the #1 brightest x-ray light source in the world).

Technology/
Innovation

Surface physics, ultra high/high vacuum, synchrotron soft x-ray spectroscopy, Auger electron spectroscopy, LEED spectroscopy, photo stimulated desorption spectroscopy.

Develop models for explaining the observation of experimental data, that was taken to investigate how temperature, geometric and electronic properties of the silicon substrate could affect etching processes.

System/
Electronics

Served as a team member for upgrading the electronics and control system at the IBM U-8 beamlines, the National Synchrotron Light Source (NSLS), Brookhaven National Laboratory.

I was a teach assistance for the 'Micro-processor(Intel 8085)', 'Circuit Analysis' (Laplace and Fourier transform) and 'Electronics' courses.

Software

Programming in Fortran 77 for improving an in-house numerical fitting program for analyzing photoemission spectra.

I was a teaching assistance for 'Numerical Analysis'.

Mechanical

I served as one of the key members in the design and construction of ultra-high vacuum (UHV) chambers, sample transfer mechanism and detectors at UCR.

Publications

J. A. Yarmoff, V. Chakarian, T. D. Durbin, C. W. Lo, D. K. Shuh, W. C. Simpson, and P. R. Varekamp, “Photon Stimulated Desorption of Halogens”, Nucl. Instrum. Methods, 101, 60(1995).

D.K. Shuh, C.W. Lo, and J.A. Yarmoff, “Chlorine Chemisorption on and the Onset of Etching of GaAs(110) at Room Temperature,” Surf. Sci. 303, 89(1994).

T.D. Durbin, W.C. Simpson, V. Chakarian, D.K. Shuh, P.R. Varekamp, C.W. Lo, J.A. Yarmoff, “Stimulated desorption of Cl+ and the chemisorption of Cl2 on Si(111)-7x7 and Si(100)-2x1,” Surf. Sci., 316, 257(1994).

C.W. Lo, D.K. Shuh, V. Chakarian, T.D. Durbin, P.R. Varekamp, and J.A. Yarmoff, "XeF2 Etching of Si(111): The Geometric Structure of the Reaction Layer," Phys. Rev. B, 47, 15648(1993).

C.W. Lo, D.K. Shuh, and J.A. Yarmoff, "The Influence of Electronic Structure on XeF2 Etching of Si(111)," J. Vac. Sci. Technol., 11, 2054(1993).

C.W. Lo, P.R. Varekamp, D.K. Shuh, T.D. Durbin, V. Chakarian, and J. A. Yarmoff, "Substrate Disorder Induced by a Surface Chemical Reaction: The Fluorine Silicon Interaction", Surf. Sci. 292, 171(1993).

J.A. Yarmoff, D.K. Shuh, V. Chakarian, P.R. Varekamp, T.D. Durbin, K.A.H. German, and C.W. Lo, "Photon Stimulated Desorption of Fluorine from Semiconductor Surfaces", in Desorption Induced by Electronic Transitions DIET-V, (Springer-Verlag, Berlin, 1993), p. 253-258.

J.A. Yarmoff, D.K. Shuh, T.D. Durbin, C.W. Lo, D.A. Lapiano-Smith, F.R. McFeely and F.J. Himpsel, "Atomic Layer Epitaxy of Silicon by Dichlorosilane Studied with Core Level Spectroscopy", J. Vac. Sci. Technol. A 10, 2303(1992).

C.W. Lo, D.K. Shuh, V. Chakarian, K.A. German and J.A. Yarmoff, "Synchrotron Radiation Studies of the XeF2 Etching of Silicon," in Proceedings of the Conference on Dry Processing, Tokyo, Japan, November, 1990.

J.A. Yarmoff, S.A. Joyce, C.W. Lo and J. Song, "Photon Stimulated Desorption of Fluorine from Silicon Etched with XeF2," in Desorption Induced by Electronic Transitions DIET-IV, edited by G. Betz and P. Varga (Springer-Verlag, Berlin, 1990), p. 65-74.